ZEISS introduces its new field emission scanning electron microscope (FE-SEM) ZEISS GeminiSEM 450. The instrument combines ultrahigh resolution imaging with the capability to perform advanced analytics while maintaining flexibility and ease-of-use.
In addition, ZEISS GeminiSEM 450 has been designed to cater for a broad variety of sample types from classical conductive metals to beam sensitive polymers. In particular the variable pressure technology of ZEISS GeminiSEM 450 reduces charging on non-conductive samples without compromising Inlens detection capabilities and at the same time enables high resolution EDS analysis by minimizing the skirt effect. Based on this design, ZEISS GeminiSEM 450 provides a flexible instrument suited to a broad variety of applications in materials science, industrial labs and life sciences.
“With ZEISS GeminiSEM 450 we have introduced a new FE-SEM flagship for highest performance analytics and ultrahigh resolution. In addition to this product launch, we are also rolling out significant enhancements to both the ZEISS GeminiSEM and ZEISS Sigma families. As an example, the ZEISS Sigma family now benefits from the introduction of the high resolution gun mode that has previously only been available on the ZEISS Gemini series” says Dr. Michael Albiez, head of electron microscopy at ZEISS.