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Anton Paar Announces New Software Product: Tosca™ Analysis for Industrial AFM Users

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by Digital Surf
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Tosca™ 400 atomic force microscope with Tosca™ analysis softwareGraz, Austria & Besançon, France: Following the recent launch of the Tosca™ 400 atomic force microscope, the leading scientific equipment manufacturing company Anton Paar is today announcing the launch of Tosca™ analysis software, based on Digital Surf’s Mountains® surface analysis technology.

Specially designed for industrial users, the Tosca™ 400 comes with ToscaTM Control software for operating the AFM. Add to that new Tosca™ analysis software and users now have a complete solution for complex nano-surface analysis in a wide variety of application areas including characterization of semiconductor properties and investigation of polymer chains.

Main features include:

  • Real-time 3D multi-channel imaging with overlays
  • Characterization of surface texture using the latest 3D parameters defined in the ISO 25178 standard
  • State-of-the-art geometry & morphology analysis at the nanoscale including height of grains and motifs, volume of surface structures (bumps, holes), step heights etc.
  • Powerful automation features for demanding applications including critical dimensioning & statistics
  • Co-localization of surface data from other analyses for correlative analysis e.g. Raman chemical maps

Lithographic patterns of aluminum nanoparticlesLithographic patterns of aluminum nanoparticles on ITO coated glass (3D view of sample generated using Tosca™ analysis software).Available in 11 different languages, Tosca™ analysis software comes with a user-friendly ribbon interface and contextual tabs with intuitive icon-based tools.

The interactive workflow allows full metrologicial traceability and easy fine-tuning at any time.

Generating surface analysis reports in Excel, PDF and Word-compatible RTF formats has never been easier.

Additionally, automation tools help speed up production (for example analysis routines can be saved as templates and re-applied to batches.)

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