How it Works: Atomic Layer Deposition Valves

The atomic layer deposition (ALD) process deposits thin films of precursor materials onto substrates one atomic layer at a time to impart such properties as conductivity, chemical resistance, and strength. Research and development operations utilize ALD systems to investigate new applications for producing advanced technologies such as semiconductor wafers, nanoelectronics, and optics.

Written bySwagelok
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Problem: The atomic layer deposition (ALD) process deposits thin films of precursor materials onto substrates one atomic layer at a time to impart such properties as conductivity, chemical resistance, and strength. Research and development operations utilize ALD systems to investigate new applications for producing advanced technologies such as semiconductor wafers, nanoelectronics, and optics. Labs also use ALD to experiment on novelty applications including coatings for drill bits, dental implants, food packaging, and even butterfly wings.

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