Researchers at the National Institute of Standards and Technology (NIST) and the University of Maryland have demonstrated that a new spectroscopy technique* can simultaneously measure a material's topography and chemical composition with nanometer-scale spatial resolution.
While infrared (IR) microscopy has been used since the 1950s to determine the chemical composition of materials, the spatial resolution of the technique has been limited to tens of micrometers; the new approach reported by NIST overcomes this limitation, improving the spatial resolution by a factor of about a thousand while retaining the high chemical specificity of IR spectroscopy.









