ORNL Research Uncovers Path to Defect-Free Thin Films

A team led by Oak Ridge National Laboratory's Ho Nyung Lee has discovered a strain relaxation phenomenon in cobaltites that has eluded researchers for decades.

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OAK RIDGE, Tenn., Sep. 20, 2012 — A team led by Oak Ridge National Laboratory's Ho Nyung Lee has discovered a strain relaxation phenomenon in cobaltites that has eluded researchers for decades and may lead to advances in fuel cells, magnetic sensors and a host of energy-related materials.

The finding, published in Nano Letters, could change the conventional wisdom that accommodating the strain inherent during the formation of epitaxial thin films necessarily involves structural defects, said Lee, a member of the Department of Energy lab's Materials Science and Technology Division. Instead, the researchers found that some materials, in this case cobaltite, form structurally well ordered atomic patterns that can change their magnetic properties and effectively minimize the size mismatch with the crystalline substrate.

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