Valves

For gas flow control up to 200 bar, Bronkhorst has recently developed a new, directly driven control valve
| 1 min read

The atomic layer deposition (ALD) process deposits thin films of precursor materials onto substrates one atomic layer at a time to impart such properties as conductivity, chemical resistance, and strength. Research and development operations utilize ALD systems to investigate new applications for producing advanced technologies such as semiconductor wafers, nanoelectronics, and optics.
| 3 min read














