An electron microscope-based lithography system for patterning materials at sizes as small as a single nanometer could be used to create and study materials with new properties
Problem: Users in EM facilities with several current generation tools including FE SEM and dual beam FIB/SEM will, despite taking precautions to insert only clean specimens, sometimes get contamination introduced into their microscopes. This manifests itself as a dark rectangle on areas which have been exposed to the incident beam. How can this be prevented? Can it be removed from the previously exposed samples?
Wim Leemans of Berkeley Lab’s Accelerator and Fusion Research Division heads LOASIS, the Laser and Optical Accelerator Systems Integrated Studies, an oasis indeed for students pursuing graduate studies in laser plasma acceleration (LPA).